What is the processing methods for the oxidation treatment of aluminum wafers?

What is the processing methods for the oxidation treatment of aluminum wafers?

First, natural oxidation

The oxide film formed by such aluminum oxidation treatment is relatively thin, and the thickness is usually between 0.5 μm and 4 μm. In addition, the oxidation process is porous with a softer texture. Although this aluminum oxidation treatment method has good adsorption performance, its corrosion resistance and wear resistance are not as good as other methods.

Second, electrochemical oxidation

The oxide film formed by the aluminum oxidation treatment generally has a thickness of 5 to 20 μm, and the hardness can be improved. In addition, the insulating properties and heat resistance of the comparative color can be formed, and the corrosion resistance produced is superior to that of the chemical oxide film.

Third. Chemical oxidation

This section uses chemical oxidation to treat the oxidation of aluminum. This aluminum oxidation treatment unit is very advanced and easy to operate. In addition, the invention has high production efficiency and wide application range. The most critical is that the dimensions of the aluminum parts and the dimensions of the relevant specifications are not limited.

Fourth, anodizing

This aluminum oxidation process involves placing aluminum materials and other alloys in the relevant electrolyte. Then, an oxide film is formed on the surface of the aluminum workpiece under the action of an applied current. This method is one of the most commonly used methods, because different products and different concentrations of electrolyte can help the aluminum workpiece to better control the process conditions in the oxidation process, so that the performance of most aluminum materials can be significantly improved and improved. .

In summary, the four most popular aluminum wafer oxidation treatment methods on the market.